Ultrapure Water: The Lifeline of Semiconductor Precision
In the microscopic realm of semiconductor wafer fabrication, where every micron-scale process hinges on perfection, ultrapure water (18.2MΩ·cm at 25°C) is the invisible backbone—eliminating even nanoparticle interference to safeguard nanoscale circuits.
Core Defense: Reverse Osmosis (RO) Systems
Removes >99% of particles, microbes, and dissolved salts, ensuring "zero-defect" water purity.
Collaborates with pretreatment, EDI (electrodeionization), and UV sterilization to form a multi-barrier purification chain.
Technical Challenges & Breakthroughs
12-inch wafer production: 0.05-micron impurities (hair-width scale) can disrupt photoresist integrity, slashing yield and reliability.
Custom pretreatment: Tailored solutions for varied water sources (tap, ground, surface):
● Ultrafiltration for colloid removal
● Antiscalant protocols to prevent mineral buildup
Proven impact: A display panel factory achieved 3.2% yield boost—saving tens of thousands of defect-free wafers per million produced.
Sustainability Edge
